Encounter digital IC design
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Encounter digital IC design
PRODUCTS
SoC Encounter
First Encounter
Encounter RTL Compiler
Encounter Test
Encounter Conformal ECO Designer
Encounter Conformal Equivalence Checker
Encounter Conformal Constraint Designer
Encounter Conformal Low Power
Encounter Timing System
Encounter Library Characterizer
CeltIC NDC
NanoRoute
VoltageStorm
Cadence QRC Extraction
Cadence Chip Optimizer
Cadence SiP Digital Architect
Cadence SiP Digital Layout
Cadence SiP Digital SI
DESIGN TASKS
High-performance timing closure
Implementation of large-scale designs
Analysis and signoff
Design for Manufacturing
Mixed-signal design
Applications Using the ARM Cortex-A8 Processor
Virtuoso custom design
Allegro IC-PKG-PCB co-design
OrCAD PCB design
System-in-package design
Design for manufacturing
IP catalog
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Analysis and signoff


The Digital Implementation solution from Cadence provides a complete and unified analysis environment for signoff-driven implementation, optimization, and final signoff, accounting for the interdependencies of logical, physical, electrical, and manufacturing effects.

As process technologies continue to shrink, new design and analysis challenges arise that impact manufacturing predictability and strain conventional signoff analysis solutions. Designs that pass traditional signoff standards might still fail in silicon, while guardbanding or over-conservative margins to satisfy traditional static timing analysis (STA) signoff can negate the benefits of smaller process geometries

The Digital Implementation solution delivers the most comprehensive and accurate analysis and signoff solution. It brings together logical, physical, electrical, and manufacturing domain requirements in a single, easy-to-use environment, enabling front-end to back-end design handoff, signoff-driven implementation, and final signoff. The Digital Implementation solution offers a complete debug environment for timing, signal integrity, power, concurrent multi-corner, statistical, electromigration, and thermal analysis. It allows for quick and easy multi-dimensional root-cause analysis to reach design closure and time-to-volume production much faster. Designers can prevent silicon failures and better manage variations-across both a wafer and the surface of a single chip.

Key differentiators


Complete and unified analysis environment (timing, signal integrity, power, statistical, thermal, electromigration)
Consistent, integrated, and standalone signoff solution for faster design convergence and time-to-volume production
Industry's leading statistical static timing analysis (SSTA) and thermal analysis solution
Significant reduction in signal integrity pessimism to achieve faster design closure
Accurate dynamic power grid analysis to enable precise decoupling capacitance insertion
Interface to Encounter® Conformal® Constraint Designer for constraint validation and false-path elimination
Interface to model-based verification (MBV) and DFM impact on timing, signal integrity, and power
Better productivity/usability with intuitive GUI, global timing debug, and built-in critical path SPICE simulation
Physical layout viewer and what-if analysis with multi-view cross-probing
Industry's most comprehensive and accurate effective current source model (ECSM) library and characterization for timing, signal integrity, power, and statistical analysis

White papers


Chip Design Using 45nm Processes Requires a Holistic Approach to Planning and Implementation
Next-Generation Signoff Analysis Tackles Electrical, Physical, And Manufacturing Challenges

Press releases


Stratosphere and Cadence Collaborate to Drive 45 Nanometer Design Yield and Performance Higher

Articles


09/11/07 Process Intelligent Modeling and Statistical STA improve DFM
08/17/07 Signoff for manufacturability - an absolute necessity at 45-nm
07/30/07 Challenges at the 45-nm node are great

Online demo


Necessary and Absolute Signoff Analysis for 65/45nm Design

Products


Encounter Timing System
SoC Encounter System
NanoRoute Router
VoltageStorm Power Analysis
CeltIC NDC
ECSM

Cadence Designer Network


Interview: Making Reliable Models for SSTA
Interview: 45nm and Below: Analyzing New Dimensions